ویژگی
اطلاعات اساسی
شرایط پرداخت و ارسال
مقدار حداقل تعداد سفارش:
قابل مذاکره
قیمت:
قابل مذاکره
جزئیات بسته بندی:
کارتن ، پالت ، کیس چوبی یا مطابق با بسته بندی مشتری
زمان تحویل:
30 روز کاری
شرایط پرداخت:
30 ٪ سپرده + 70 ٪ T/t قبل از حمل و نقل
قابلیت ارائه:
20 ست در ماه
آلبوم عکس
High Conductivity Film Lab Vacuum Furnace For PI Film Graphitization Production
توضیح محصول
High Conductivity Film Graphitization Furnace For PI Film Graphitization Production
Application:
It is applied to the graphitization production of high thermal conductivity film (PI film).
Features:
The temperature uniformity of the furnace body: the medium frequency induction heating, fast heating, high efficiency, unique furnace design, greatly improving the temperature uniformity of the furnace;
Low energy consumption and good stability: the world's first use of double-layer alumina brick insulation material to prevent carbon felt and coil short circuit, good heat insulation and fire resistance, low heat loss and good equipment stability;
According to the needs of the sintering process time, a plurality of electric furnaces can be arranged in a single power supply, and the plurality of furnaces are respectively energized to raise temperature and power off and cool down to realize continuous operation;
Digital flow monitoring system, water flow monitoring and protection of each power supply cabinet, high-performance intermediate frequency contactor for furnace conversion; comprehensive PLC water, electricity and gas automatic control and protection system.
The main technical parameters:
Maximum operating temperature: 3000 ° C
Common temperature: 2800 ° C
Working atmosphere in the furnace: vacuum, hydrogen, nitrogen, inert gas, etc.
Temperature uniformity: ≤ ± 25 ° C
Temperature measurement: far infrared optical temperature measurement (1000-3200 ° C);
Temperature measurement accuracy: 0.2 to 0.75%
Temperature control: program control and manual control; temperature control accuracy: ±1 °C
| Product Model Specification | |
| Volume (L) | 282 |
| Rated Temperature (°C) | 2800 |
| Limit Temperature (°C) | 3000 |
| Effective Heating Zone (Mm) | Φ600X1000 |
| Power (KW) | 300 |
| Frequency (HZ) | 1000 |
| Temperature Control Method | Japanese island electric thermostat |
| Heating Method | Induction heating |
| Vacuum System | Rotary vane vacuum pump (high vacuum requirement with Roots vacuum pump) |
| Sintering Atmosphere | N2, Ar2 and other gases |
| Rated Power Supply Voltage (V) | 380 |
| Rated Heating Voltage (V) | 750 |
| Vacuum Limit (Pa) | 100 (vacuum cold state) |
