High Conductivity Film Lab Vacuum Furnace For PI Film Graphitization Production

High Conductivity Film Graphitization Furnace For PI Film Graphitization Production

Application:

It is applied to the graphitization production of high thermal conductivity film (PI film).

Features:

The temperature uniformity of the furnace body: the medium frequency induction heating, fast heating, high efficiency, unique furnace design, greatly improving the temperature uniformity of the furnace;
Low energy consumption and good stability: the world's first use of double-layer alumina brick insulation material to prevent carbon felt and coil short circuit, good heat insulation and fire resistance, low heat loss and good equipment stability;
According to the needs of the sintering process time, a plurality of electric furnaces can be arranged in a single power supply, and the plurality of furnaces are respectively energized to raise temperature and power off and cool down to realize continuous operation;
Digital flow monitoring system, water flow monitoring and protection of each power supply cabinet, high-performance intermediate frequency contactor for furnace conversion; comprehensive PLC water, electricity and gas automatic control and protection system.
The main technical parameters:
Maximum operating temperature: 3000 ° C
Common temperature: 2800 ° C
Working atmosphere in the furnace: vacuum, hydrogen, nitrogen, inert gas, etc.
Temperature uniformity: ≤ ± 25 ° C
Temperature measurement: far infrared optical temperature measurement (1000-3200 ° C);
Temperature measurement accuracy: 0.2 to 0.75%
Temperature control: program control and manual control; temperature control accuracy: ±1 °C